fig2
Figure 2. Fabrication of a U-shaped notched substrate using a photocurable material. (A) Orthogonal view of the projected UV intensity distribution with respect to the position of the sample focal plane (zf). The inset shows experimentally measured light intensity profiles. Using a 20× objective lens, a DOF of approximately 18 μm is observed in the x-z plane. Case 1-3 illustrate representative photocured structures obtained at different zf positions, resulting in a central void, a top-surface notch, or a bottom-surface notch, respectively; (B) Comparison between simulated photocured structure profiles and experimental results. The inset shows the notch depth generated at different zf values; (C) Programs for controlling the periodicity and notch angle. UV: Ultraviolet; DOF: depth of focus.
